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2025 (Current Year) Faculty Courses School of Materials and Chemical Technology Department of Chemical Science and Engineering Graduate major in Chemical Science and Engineering

Plasma Chemistry and Plasma Processing

Academic unit or major
Graduate major in Chemical Science and Engineering
Instructor(s)
Shinsuke Mori
Class Format
Lecture
Media-enhanced courses
-
Day of week/Period
(Classrooms)
Class
-
Course Code
CAP.C533
Number of credits
100
Course offered
2025
Offered quarter
3Q
Syllabus updated
Apr 2, 2025
Language
English

Syllabus

Course overview and goals

[Summary of Lecture] This course focuses on the chemical process using plasma technology. The basic knowledge and characteristics of plasma, plasma generation methods and applications of plasma technology to the chemical processes are lectured. [Aim of Lecture] This lecture aims for students to understand the basic knowledge of the plasma chemistry and plasma processing and to acquire the ability to design and optimize the chemical processes using plasma technology.

Course description and aims

[Target] Target of this course is to understand and obtain the basic knowledge and characteristics of thermal & non-thermal plasma, thermal & non-thermal plasma generation methods and applications of plasma technology to the chemical processes and to acquire the ability to design and optimize the chemical processes using plasma technology.

Keywords

plasma, gas discharge, etching, chemical vapor deposition, sputtering, surface modification

Competencies

  • Specialist skills
  • Intercultural skills
  • Communication skills
  • Critical thinking skills
  • Practical and/or problem-solving skills

Class flow

At the beginning of each class, solutions to exercise problems that were assigned during the previous class are reviewed. Then the main points of the day’s lecture are given as exercise. At the end of class, students are asked to solve the exercise.

Course schedule/Objectives

Course schedule Objectives
Class 1 Basics of plasma and Types of Gas Discharges To explain basics of plasma and types of gas discharges
Class 2 Townsend Mechanism of Electrical Breakdown To explain Townsend mechanism of electrical breakdown
Class 3 Streamer Mechanism of Electrical Breakdown and Atmospheric Non-Thermal Plasma To explain streamer mechanism of electrical breakdown and atmospheric non-thermal plasma
Class 4 Gas Phase Reactions in Plasma To explain characteristics of plasma chemical reactions and calculate their reaction rates
Class 5 Plasma Sheath and Surface Reactions in Plasma To explain plasma sheath and surface reactions in plasma
Class 6 Non-Thermal Plasma Processing (I) To explain non-thermal plasma processing
Class 7 Non-Thermal Plasma Processing (II) To explain non-thermal plasma processing

Study advice (preparation and review)

To enhance effective learning, students are encouraged to spend approximately 100 minutes preparing for class and another 100 minutes reviewing class content afterwards (including assignments) for each class.
They should do so by referring to textbooks and other course material.

Textbook(s)

None required

Reference books, course materials, etc.

Materials provided in the class will be used.

Evaluation methods and criteria

Assessment is based on the exercise and final exam

Related courses

  • CAP.C206 : Chemical Reaction Engineering I (Homogeneous System)
  • CAP.C211 : Energy Transfer Operation
  • CAP.C201 : Transport Phenomena I (Momentum)
  • CAP.C202 : Transport Phenomena II (Heat)
  • CAP.C203 : Transport Phenomena III (Mass)
  • CAP.C421 : Advanced Energy Transfer Operation
  • CAP.C422 : Advanced Chemical Reaction Engineering

Prerequisites

No prerequisites.

Contact information (e-mail and phone) Notice : Please replace from ”[at]” to ”@”(half-width character).

mori[at]mct.isct.ac.jp : Shinsuke Mori

Office hours

Contact by e-mail in advance to make an appointment.