2025 (Current Year) Faculty Courses School of Materials and Chemical Technology Department of Chemical Science and Engineering Graduate major in Chemical Science and Engineering
Plasma Chemistry and Plasma Processing
- Academic unit or major
- Graduate major in Chemical Science and Engineering
- Instructor(s)
- Shinsuke Mori
- Class Format
- Lecture
- Media-enhanced courses
- -
- Day of week/Period
(Classrooms) - Class
- -
- Course Code
- CAP.C533
- Number of credits
- 100
- Course offered
- 2025
- Offered quarter
- 3Q
- Syllabus updated
- Apr 2, 2025
- Language
- English
Syllabus
Course overview and goals
[Summary of Lecture] This course focuses on the chemical process using plasma technology. The basic knowledge and characteristics of plasma, plasma generation methods and applications of plasma technology to the chemical processes are lectured. [Aim of Lecture] This lecture aims for students to understand the basic knowledge of the plasma chemistry and plasma processing and to acquire the ability to design and optimize the chemical processes using plasma technology.
Course description and aims
[Target] Target of this course is to understand and obtain the basic knowledge and characteristics of thermal & non-thermal plasma, thermal & non-thermal plasma generation methods and applications of plasma technology to the chemical processes and to acquire the ability to design and optimize the chemical processes using plasma technology.
Keywords
plasma, gas discharge, etching, chemical vapor deposition, sputtering, surface modification
Competencies
- Specialist skills
- Intercultural skills
- Communication skills
- Critical thinking skills
- Practical and/or problem-solving skills
Class flow
At the beginning of each class, solutions to exercise problems that were assigned during the previous class are reviewed. Then the main points of the day’s lecture are given as exercise. At the end of class, students are asked to solve the exercise.
Course schedule/Objectives
Course schedule | Objectives | |
---|---|---|
Class 1 | Basics of plasma and Types of Gas Discharges | To explain basics of plasma and types of gas discharges |
Class 2 | Townsend Mechanism of Electrical Breakdown | To explain Townsend mechanism of electrical breakdown |
Class 3 | Streamer Mechanism of Electrical Breakdown and Atmospheric Non-Thermal Plasma | To explain streamer mechanism of electrical breakdown and atmospheric non-thermal plasma |
Class 4 | Gas Phase Reactions in Plasma | To explain characteristics of plasma chemical reactions and calculate their reaction rates |
Class 5 | Plasma Sheath and Surface Reactions in Plasma | To explain plasma sheath and surface reactions in plasma |
Class 6 | Non-Thermal Plasma Processing (I) | To explain non-thermal plasma processing |
Class 7 | Non-Thermal Plasma Processing (II) | To explain non-thermal plasma processing |
Study advice (preparation and review)
To enhance effective learning, students are encouraged to spend approximately 100 minutes preparing for class and another 100 minutes reviewing class content afterwards (including assignments) for each class.
They should do so by referring to textbooks and other course material.
Textbook(s)
None required
Reference books, course materials, etc.
Materials provided in the class will be used.
Evaluation methods and criteria
Assessment is based on the exercise and final exam
Related courses
- CAP.C206 : Chemical Reaction Engineering I (Homogeneous System)
- CAP.C211 : Energy Transfer Operation
- CAP.C201 : Transport Phenomena I (Momentum)
- CAP.C202 : Transport Phenomena II (Heat)
- CAP.C203 : Transport Phenomena III (Mass)
- CAP.C421 : Advanced Energy Transfer Operation
- CAP.C422 : Advanced Chemical Reaction Engineering
Prerequisites
No prerequisites.
Contact information (e-mail and phone) Notice : Please replace from ”[at]” to ”@”(half-width character).
mori[at]mct.isct.ac.jp : Shinsuke Mori
Office hours
Contact by e-mail in advance to make an appointment.